Институтът по микроелектроника в Белгия предлага следните научно-изследователски теми за дипломни работи:
- Radiation assessment of advanced deep submicron technologies.
- Chemical & structural characterization of polymer films deposited by CCP plasma.
- Plasma damage of low-k dielectrics.
- Silica Zeolite thin films.
- Advanced Single Wafer Megasonic Cleaning for IC manufacturing.
- Advanced physical cleaning with ultrasound (megasonic cleaning).
- Balancing particle removal and damage formation using spray cleaning technology.
- Chemistry for the removal of post-etch photoresist layers.
- Cleaning of post-etch photoresist layer on patterned surfaces.
- Doped-Si loss in cleaning solutions for advanced nano-technologies.
- Optimization of chamber conditioning for dry etching of microelectronic devices.
- Evaluation of new methodologies to assess contamination on edges of semiconductor substrates.
- Optimization of power transfer for ultrasonic piezo-electric transducers.
- Sealing of porous low-k dielectrics by wet means.
- SiGe substrate loss in cleaning solutions for advanced nano-technologies.
- Study of rare earth chlorination.
- In-situ temperature measurements during plasma etch experiments in TCP and CCP reactors.
- The impact of density-of-states and effective mass on device performance.
- Stiction avoidance of microstructures after drying.
- Passivation of highly doped substrates.
- Modeling and Imaging of Droplet Impact during Spray Cleaning.
- Drying phenomena occuring during advanced processing.
- Study of high-k dry removal selectivity at elevated temperature.
За желаещите са осигурени стипендии до 700 евро и самолетен билет. Начало – февруари 2008 година. За справки в Химически факултет: доц. дхн Георги Василев, катедра „Обща и неорганична химия с методика на обучението по химия“, тел: 261-425