Химически факултет

Институтът по микроелектроника в Белгия предлага следните научно-изследователски теми за дипломни работи:

1. Radiation assessment of advanced deep submicron technologies.
2. Chemical & structural characterization of polymer films deposited by CCP plasma.
3. Plasma damage of low-k dielectrics.
4. Silica Zeolite thin films.
5. Advanced Single Wafer Megasonic Cleaning for IC manufacturing.
6. Advanced physical cleaning with ultrasound (megasonic cleaning).
7. Balancing particle removal and damage formation using spray cleaning technology.
8. Chemistry for the removal of post-etch photoresist layers.
9. Cleaning of post-etch photoresist layer on patterned surfaces.
10. Doped-Si loss in cleaning solutions for advanced nano-technologies.
11. Optimization of chamber conditioning for dry etching of microelectronic devices.
12. Evaluation of new methodologies to assess contamination on edges of semiconductor substrates.
13. Optimization of power transfer for ultrasonic piezo-electric transducers.
14. Sealing of porous low-k dielectrics by wet means.
15. SiGe substrate loss in cleaning solutions for advanced nano-technologies.
16. Study of rare earth chlorination.
17. In-situ temperature measurements during plasma etch experiments in TCP and CCP reactors.
18. The impact of density-of-states and effective mass on device performance.
19. Stiction avoidance of microstructures after drying.
20. Passivation of highly doped substrates.
21. Modeling and Imaging of Droplet Impact during Spray Cleaning.
22. Drying phenomena occuring during advanced processing.
23. Study of high-k dry removal selectivity at elevated temperature.

За желаещите са осигурени стипендии до 700 евро и самолетен билет. Начало – февруари 2008 година.  За справки в Химически факултет: доц. дхн Георги Василев, катедра „Обща и неорганична химия с методика на обучението по химия“, тел: 261-425