{"id":283,"date":"2007-12-14T10:45:43","date_gmt":"2007-12-14T08:45:43","guid":{"rendered":"http:\/\/argon.uni-plovdiv.bg\/?p=283"},"modified":"2007-12-14T10:45:43","modified_gmt":"2007-12-14T08:45:43","slug":"%d1%80%d0%b0%d0%b7%d1%80%d0%b0%d0%b1%d0%be%d1%82%d0%b2%d0%b0%d0%bd%d0%b5-%d0%bd%d0%b0-%d0%b4%d0%b8%d0%bf%d0%bb%d0%be%d0%bc%d0%bd%d0%b8-%d1%80%d0%b0%d0%b1%d0%be%d1%82%d0%b8-%d0%b2-%d0%b1%d0%b5%d0%bb","status":"publish","type":"post","link":"https:\/\/blogs.uni-plovdiv.net\/argon\/?p=283","title":{"rendered":"\u0420\u0430\u0437\u0440\u0430\u0431\u043e\u0442\u0432\u0430\u043d\u0435 \u043d\u0430 \u0434\u0438\u043f\u043b\u043e\u043c\u043d\u0438 \u0440\u0430\u0431\u043e\u0442\u0438 \u0432 \u0411\u0435\u043b\u0433\u0438\u044f"},"content":{"rendered":"

\u0418\u043d\u0441\u0442\u0438\u0442\u0443\u0442\u044a\u0442 \u043f\u043e \u043c\u0438\u043a\u0440\u043e\u0435\u043b\u0435\u043a\u0442\u0440\u043e\u043d\u0438\u043a\u0430 \u0432 \u0411\u0435\u043b\u0433\u0438\u044f \u043f\u0440\u0435\u0434\u043b\u0430\u0433\u0430 \u0441\u043b\u0435\u0434\u043d\u0438\u0442\u0435 \u043d\u0430\u0443\u0447\u043d\u043e-\u0438\u0437\u0441\u043b\u0435\u0434\u043e\u0432\u0430\u0442\u0435\u043b\u0441\u043a\u0438 \u0442\u0435\u043c\u0438 \u0437\u0430 \u0434\u0438\u043f\u043b\u043e\u043c\u043d\u0438 \u0440\u0430\u0431\u043e\u0442\u0438:<\/p>\n

    \n
  1. Radiation assessment of advanced deep submicron technologies.<\/li>\n
  2. Chemical & structural characterization of polymer films deposited by CCP plasma.<\/li>\n
  3. Plasma damage of low-k dielectrics.<\/li>\n
  4. Silica Zeolite thin films.<\/li>\n
  5. Advanced Single Wafer Megasonic Cleaning for IC manufacturing.<\/li>\n
  6. Advanced physical cleaning with ultrasound (megasonic cleaning).<\/li>\n
  7. Balancing particle removal and damage formation using spray cleaning technology.<\/li>\n
  8. Chemistry for the removal of post-etch photoresist layers.<\/li>\n
  9. Cleaning of post-etch photoresist layer on patterned surfaces.<\/li>\n
  10. Doped-Si loss in cleaning solutions for advanced nano-technologies.<\/li>\n
  11. Optimization of chamber conditioning for dry etching of microelectronic devices.<\/li>\n
  12. Evaluation of new methodologies to assess contamination on edges of semiconductor substrates.<\/li>\n
  13. Optimization of power transfer for ultrasonic piezo-electric transducers.<\/li>\n
  14. Sealing of porous low-k dielectrics by wet means.<\/li>\n
  15. SiGe substrate loss in cleaning solutions for advanced nano-technologies.<\/li>\n
  16. Study of rare earth chlorination.<\/li>\n
  17. In-situ temperature measurements during plasma etch experiments in TCP and CCP reactors.<\/li>\n
  18. The impact of density-of-states and effective mass on device performance.<\/li>\n
  19. Stiction avoidance of microstructures after drying.<\/li>\n
  20. Passivation of highly doped substrates.<\/li>\n
  21. Modeling and Imaging of Droplet Impact during Spray Cleaning.<\/li>\n
  22. Drying phenomena occuring during advanced processing.<\/li>\n
  23. Study of high-k dry removal selectivity at elevated temperature.<\/li>\n<\/ol>\n

    \u0417\u0430 \u0436\u0435\u043b\u0430\u0435\u0449\u0438\u0442\u0435 \u0441\u0430 \u043e\u0441\u0438\u0433\u0443\u0440\u0435\u043d\u0438 \u0441\u0442\u0438\u043f\u0435\u043d\u0434\u0438\u0438 \u0434\u043e 700 \u0435\u0432\u0440\u043e \u0438 \u0441\u0430\u043c\u043e\u043b\u0435\u0442\u0435\u043d \u0431\u0438\u043b\u0435\u0442. \u041d\u0430\u0447\u0430\u043b\u043e – \u0444\u0435\u0432\u0440\u0443\u0430\u0440\u0438 2008 \u0433\u043e\u0434\u0438\u043d\u0430.\u00a0 \u0417\u0430 \u0441\u043f\u0440\u0430\u0432\u043a\u0438 \u0432 \u0425\u0438\u043c\u0438\u0447\u0435\u0441\u043a\u0438 \u0444\u0430\u043a\u0443\u043b\u0442\u0435\u0442: \u0434\u043e\u0446. \u0434\u0445\u043d \u0413\u0435\u043e\u0440\u0433\u0438 \u0412\u0430\u0441\u0438\u043b\u0435\u0432, \u043a\u0430\u0442\u0435\u0434\u0440\u0430 „\u041e\u0431\u0449\u0430 \u0438 \u043d\u0435\u043e\u0440\u0433\u0430\u043d\u0438\u0447\u043d\u0430 \u0445\u0438\u043c\u0438\u044f \u0441 \u043c\u0435\u0442\u043e\u0434\u0438\u043a\u0430 \u043d\u0430 \u043e\u0431\u0443\u0447\u0435\u043d\u0438\u0435\u0442\u043e \u043f\u043e \u0445\u0438\u043c\u0438\u044f“, \u0442\u0435\u043b: 261-425<\/p>\n","protected":false},"excerpt":{"rendered":"

    \u0418\u043d\u0441\u0442\u0438\u0442\u0443\u0442\u044a\u0442 \u043f\u043e \u043c\u0438\u043a\u0440\u043e\u0435\u043b\u0435\u043a\u0442\u0440\u043e\u043d\u0438\u043a\u0430 \u0432 \u0411\u0435\u043b\u0433\u0438\u044f \u043f\u0440\u0435\u0434\u043b\u0430\u0433\u0430 \u0441\u043b\u0435\u0434\u043d\u0438\u0442\u0435 \u043d\u0430\u0443\u0447\u043d\u043e-\u0438\u0437\u0441\u043b\u0435\u0434\u043e\u0432\u0430\u0442\u0435\u043b\u0441\u043a\u0438 \u0442\u0435\u043c\u0438 \u0437\u0430 \u0434\u0438\u043f\u043b\u043e\u043c\u043d\u0438 \u0440\u0430\u0431\u043e\u0442\u0438: Radiation assessment of advanced deep submicron technologies. Chemical & structural characterization of polymer films deposited by CCP plasma. Plasma damage of low-k dielectrics. Silica Zeolite thin films. Advanced Single Wafer Megasonic Cleaning for IC manufacturing. Advanced physical cleaning with ultrasound (megasonic cleaning). Balancing […]<\/p>\n","protected":false},"author":2,"featured_media":0,"comment_status":"open","ping_status":"closed","sticky":false,"template":"","format":"standard","meta":[],"categories":[2],"tags":[],"_links":{"self":[{"href":"https:\/\/blogs.uni-plovdiv.net\/argon\/index.php?rest_route=\/wp\/v2\/posts\/283"}],"collection":[{"href":"https:\/\/blogs.uni-plovdiv.net\/argon\/index.php?rest_route=\/wp\/v2\/posts"}],"about":[{"href":"https:\/\/blogs.uni-plovdiv.net\/argon\/index.php?rest_route=\/wp\/v2\/types\/post"}],"author":[{"embeddable":true,"href":"https:\/\/blogs.uni-plovdiv.net\/argon\/index.php?rest_route=\/wp\/v2\/users\/2"}],"replies":[{"embeddable":true,"href":"https:\/\/blogs.uni-plovdiv.net\/argon\/index.php?rest_route=%2Fwp%2Fv2%2Fcomments&post=283"}],"version-history":[{"count":0,"href":"https:\/\/blogs.uni-plovdiv.net\/argon\/index.php?rest_route=\/wp\/v2\/posts\/283\/revisions"}],"wp:attachment":[{"href":"https:\/\/blogs.uni-plovdiv.net\/argon\/index.php?rest_route=%2Fwp%2Fv2%2Fmedia&parent=283"}],"wp:term":[{"taxonomy":"category","embeddable":true,"href":"https:\/\/blogs.uni-plovdiv.net\/argon\/index.php?rest_route=%2Fwp%2Fv2%2Fcategories&post=283"},{"taxonomy":"post_tag","embeddable":true,"href":"https:\/\/blogs.uni-plovdiv.net\/argon\/index.php?rest_route=%2Fwp%2Fv2%2Ftags&post=283"}],"curies":[{"name":"wp","href":"https:\/\/api.w.org\/{rel}","templated":true}]}}